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Because of the amount of data and the tediousness of a conventional absorption correction, real quantitative maps only showed up recently. Williams et al. (1998) presented a few years ago real quantitative maps using the zeta-factor approach. The maps show interfacial segregation with a spatial resolution of better than 5 nm. Williams is keen to point out that while line scans are very useful, they are very selective and operator-biased because of the choice that has to made of where to acquire the line-scan. Quantitative X-ray maps have been a standard procedure on bulk sample both in the SEM and the electron probe microanalyser (EPMA) for many years now. Because X-ray generation in bulk samples is signi cantly more important than in thin specimens and sample thickness is not an issue, quantitative maps can be acquired in a timely manner and absorption and uorescence corrections can be applied on the y or off-line depending on the computing power. The main problem with X-ray maps on bulk samples is the poor spatial resolution which depending on the initial beam energy is of the order of 0.5 to 1.0 m. For most materials science problems, such as interfacial segregation, this is by far insuf cient. X-Ray spatial resolution when using thin TEMlike samples is mainly determined by the electron probe size and some beam broadening occurring in the foil. The primary excitation volume is orders of magnitude smaller than in the bulk case. An immediate consequence is that the X-ray count rate is dramatically reduced which means that probe intensity and X-ray collection angle have to be

Figure 24-1: The Visual Studio .NET XML editor provides an interface and set of tools to simply enter and manipulate XML documents from within the IDE environment. Figure 24-2: Switch to the Data view of an XML document to edit XML documents in a database-like editor. Figure 24-3: You can graphically generate an XML Schema document by using the Visual Studio .NET XML Schema designer.

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A U.S. standalone license requires only a 16-digit serial number and an 8-character registration code to install and run. Starting with SolidWorks 2007, this will begin to change to a new process called activation. Activation works like activating Windows XP over the Internet.

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FIGURE 2.24 The detached PropertyManager, the flyout FeatureManager, and the split FeatureManager Detached PropertyManager Flyout FeatureManager Split Feature Manager

with m* = mi, etc.]; m, and mt are the classic effective mass of an electron in silicon (mi -= 0.98m 0 and mt = 0.19 m0 , where mo is the mass of the electron in a vacuum).

Too many processes are competing for access to the CPU or one or more processes are using the CPU excessively. Memory is in such high demand that the system is heavily paging or swapping. Disks are slow or I/O is excessively heavy. The network interface is overloaded.

Building on the success of the Starfire (see 17), the line of servers that introduced dynamic reconfiguration and capacity on demand, Sun now offers a new line of servers the Sun Fire servers. When the first edition of this book came out, the Enterprise 10000 (Starfire) was the most amazing system we had ever seen. Well, we have been amazed once again. This new family of servers offers many technological advances over the UltraSPARC II family of servers. In this chapter, we take a look at the architecture of this new product line and explain how the new features provide an unprecedented level of reliability, availability, and serviceability (or RAS). We explain how RAS is incorporated into the basic design aspects of this product line to contribute to a higher level of operation and a reduction in downtime for the services that they provide. We will also offer suggestions on how to administer and troubleshoot basic problems on these systems.

Great progress has been demonstrated in the last 20 years in the development of wet chemical methods for the fabrication of inorganic lms for electronic applications. A variety of solution chemistries and lm fabrication strategies have been developed that may be used to fabricate thin lms with excellent

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